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6" Fab For Sale from Moov - Click Here to Learn More
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ASML TWINSCAN AT:1150C
    설명
    설명 없음
    환경 설정
    -ARF Scanners, 12" -193nm
    OEM 모델 설명
    The TWINSCAN C product family will be available on four systems: the AT:400C, AT:750C, AT:850C and AT:1150C. The productivity enhancements in TWINSCAN C increase wafer output to over 110 wafers per hour for 300 mm wafers at real production conditions (109 exposures per wafer). The increased stage speeds in the TWINSCAN platform allow for these productivity improvements while maintaining imaging, alignment and leveling accuracy.
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    ASML

    TWINSCAN AT:1150C

    verified-listing-icon

    검증됨

    카테고리
    Steppers & Scanners

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    65726


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    ASML TWINSCAN AT:1150C

    ASML

    TWINSCAN AT:1150C

    Steppers & Scanners
    빈티지: 0조건: 중고
    마지막 검증일60일 이상 전

    ASML

    TWINSCAN AT:1150C

    verified-listing-icon
    검증됨
    카테고리
    Steppers & Scanners
    마지막 검증일: 60일 이상 전
    listing-photo-06fd0190b07d40eba0a142c0c3094dc1-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    65726


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    -ARF Scanners, 12" -193nm
    OEM 모델 설명
    The TWINSCAN C product family will be available on four systems: the AT:400C, AT:750C, AT:850C and AT:1150C. The productivity enhancements in TWINSCAN C increase wafer output to over 110 wafers per hour for 300 mm wafers at real production conditions (109 exposures per wafer). The increased stage speeds in the TWINSCAN platform allow for these productivity improvements while maintaining imaging, alignment and leveling accuracy.
    문서

    문서 없음

    유사 등재물
    모두 보기
    ASML TWINSCAN AT:1150C

    ASML

    TWINSCAN AT:1150C

    Steppers & Scanners빈티지: 0조건: 중고마지막 검증일:60일 이상 전