설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The TWINSCAN XT:1400F is a dual-stage ArF lithography tool optimized for 200-mm and 300-mm wafer production at 65-nm resolution. Leveraging a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, it pushes ArF technology beyond the 65-nm node. Its dual wafer-stage permits simultaneous exposure and alignment, maximizing productivity. The system ensures superior focus across the full wafer and boasts a throughput of 133 300-mm wph and 165 200-mm wph. Equipped for extreme low-k1 operation, it offers an enhanced process window, consistent CD uniformity, and onboard metrology for process tracking.문서
문서 없음
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Installed / Running
제품 ID:
131868
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
TWINSCAN XT:1400
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Installed / Running
제품 ID:
131868
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The TWINSCAN XT:1400F is a dual-stage ArF lithography tool optimized for 200-mm and 300-mm wafer production at 65-nm resolution. Leveraging a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, it pushes ArF technology beyond the 65-nm node. Its dual wafer-stage permits simultaneous exposure and alignment, maximizing productivity. The system ensures superior focus across the full wafer and boasts a throughput of 133 300-mm wph and 165 200-mm wph. Equipped for extreme low-k1 operation, it offers an enhanced process window, consistent CD uniformity, and onboard metrology for process tracking.문서
문서 없음