설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The TWINSCAN XT:1700Fi is a state-of-the-art, dual-stage immersion lithography tool, specifically engineered for high-volume 300-mm wafer production. It boasts a resolution of 50 nm and below, making it a powerhouse for intricate semiconductor manufacturing. It features a 1.2-NA in-line catadioptric lens, an illuminator with optimized polarization mode, and advanced stage technology. It meets overlay and focus requirements and achieves a throughput of 122 wafers per hour. The tool also includes an extended ultra-k1 package with various enhancements.문서
문서 없음
ASML
TWINSCAN XT:1700Fi
검증됨
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
100682
웨이퍼 사이즈:
알 수 없음
빈티지:
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
TWINSCAN XT:1700Fi
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
100682
웨이퍼 사이즈:
알 수 없음
빈티지:
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The TWINSCAN XT:1700Fi is a state-of-the-art, dual-stage immersion lithography tool, specifically engineered for high-volume 300-mm wafer production. It boasts a resolution of 50 nm and below, making it a powerhouse for intricate semiconductor manufacturing. It features a 1.2-NA in-line catadioptric lens, an illuminator with optimized polarization mode, and advanced stage technology. It meets overlay and focus requirements and achieves a throughput of 122 wafers per hour. The tool also includes an extended ultra-k1 package with various enhancements.문서
문서 없음