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설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The Canon Stepper FPA-3000 EX3 is a photolithography tool used in semiconductor manufacturing. It has a 6" square quartz reticle and can handle 4” to 8” wafers. The projection optics have a 1/5X magnification and a numerical aperture of .40-.60. The exposure light is KrF (248nm). The illumination system uses a KrF Cymer/ELS4300 light source with an output of 7.2W. The printing performance has a resolution of <0.25μm and depth of focus of >.70μm. The alignment system has reticle rotation accuracy of <±0.01μm on wafer and wafer alignment of <0.055μm mean + 3sigma. The focus/leveling system has focus repeatability of <0.10μm (3sigma). The stage has step accuracy of <0.04μm (3sigma). The throughput is >73 wafers/hour for Φ6", 22mm, 32 shots and >53 wafers/hour for Φ8", 22mm, 60 shots.문서
문서 없음
CANON
FPA-3000EX3
검증됨
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
72683
웨이퍼 사이즈:
알 수 없음
빈티지:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CANON
FPA-3000EX3
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
72683
웨이퍼 사이즈:
알 수 없음
빈티지:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The Canon Stepper FPA-3000 EX3 is a photolithography tool used in semiconductor manufacturing. It has a 6" square quartz reticle and can handle 4” to 8” wafers. The projection optics have a 1/5X magnification and a numerical aperture of .40-.60. The exposure light is KrF (248nm). The illumination system uses a KrF Cymer/ELS4300 light source with an output of 7.2W. The printing performance has a resolution of <0.25μm and depth of focus of >.70μm. The alignment system has reticle rotation accuracy of <±0.01μm on wafer and wafer alignment of <0.055μm mean + 3sigma. The focus/leveling system has focus repeatability of <0.10μm (3sigma). The stage has step accuracy of <0.04μm (3sigma). The throughput is >73 wafers/hour for Φ6", 22mm, 32 shots and >53 wafers/hour for Φ8", 22mm, 60 shots.문서
문서 없음