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Suitable for variety of wafer types: Silicon, Silicon Carbide, Gallium Nitride, and all other Compound Semi substrates as well as clear wafers. Reticle size: 6" Square Field Size: 22 X 22 mm Exposure Light: 365nm Light Source: 2.0KW Super High Pressure Hg Lamp Projection Magnification: 1/5 X Numerical Aperture: 0.63~0.45 Estimated Throughput: 59 wph (60 shot / 22 mm / 8” Wafer) 83 wph (32 shot / 22 mm / 6" Wafer) illumination data taken in July 2024: Uniformity : 0.921% Intensity : 9,916 w/mOEM 모델 설명
The Canon FPA-3000 i4 is a stepper used in the semiconductor industry. It has a reticle size of 6" square with a thickness of 0.25" and is made of quartz material1. It can handle wafer sizes of 4" through 8" that are SEMI Standard, JEIDA, Notch/Flat. The Canon FPA-3000 i4 has a projection magnification of 1/5 X and a numerical aperture of .45 - .63. The field size is 22x22 17x26 and the exposure light is Kr F (365nm). The estimated throughput of the Canon FPA-3000 i4 is 59 wafers per hour for an 8" wafer with 60 shots and 22 mm field size. For a 6" wafer, it can handle up to 83 wafers per hour with 32 shots and 22 mm field size. The Canon FPA-3000 i4 has an alignment accuracy of less than 0.06 μm (mean + 3 σ). The Canon FPA-3000 i4 has a resolution of 0.35 μm.문서
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CANON
FPA-3000i4
검증됨
카테고리
Steppers & Scanners
마지막 검증일: 2일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
117147
웨이퍼 사이즈:
4"/100mm, 6"/150mm, 8"/200mm
빈티지:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
CANON
FPA-3000i4
카테고리
Steppers & Scanners
마지막 검증일: 2일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
117147
웨이퍼 사이즈:
4"/100mm, 6"/150mm, 8"/200mm
빈티지:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Suitable for variety of wafer types: Silicon, Silicon Carbide, Gallium Nitride, and all other Compound Semi substrates as well as clear wafers. Reticle size: 6" Square Field Size: 22 X 22 mm Exposure Light: 365nm Light Source: 2.0KW Super High Pressure Hg Lamp Projection Magnification: 1/5 X Numerical Aperture: 0.63~0.45 Estimated Throughput: 59 wph (60 shot / 22 mm / 8” Wafer) 83 wph (32 shot / 22 mm / 6" Wafer) illumination data taken in July 2024: Uniformity : 0.921% Intensity : 9,916 w/mOEM 모델 설명
The Canon FPA-3000 i4 is a stepper used in the semiconductor industry. It has a reticle size of 6" square with a thickness of 0.25" and is made of quartz material1. It can handle wafer sizes of 4" through 8" that are SEMI Standard, JEIDA, Notch/Flat. The Canon FPA-3000 i4 has a projection magnification of 1/5 X and a numerical aperture of .45 - .63. The field size is 22x22 17x26 and the exposure light is Kr F (365nm). The estimated throughput of the Canon FPA-3000 i4 is 59 wafers per hour for an 8" wafer with 60 shots and 22 mm field size. For a 6" wafer, it can handle up to 83 wafers per hour with 32 shots and 22 mm field size. The Canon FPA-3000 i4 has an alignment accuracy of less than 0.06 μm (mean + 3 σ). The Canon FPA-3000 i4 has a resolution of 0.35 μm.문서
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