설명
Canon I-line lithography machine uses a 365nm wavelength light source for exposure. It is a key device for realizing the manufacturing of micron-level semiconductor devices. It has more excellent alignment accuracy and is widely used in the production of 4-inch, 6-inch, 8-inch and 12-inch wafers.환경 설정
0.35 0.45~0.63 5:1 22*26 50OEM 모델 설명
The FPA-3000i5+ is a high productivity mix-and-match partner with Canon excimer series scanners and steppers. Wide-field lens with extra NA variability supports a variety of fine patterning processes. This highly proven and successful veteran of the Canon stepper line-up has been a best-selling product since its release in 1996. Features: -Supports varieties of fine pattern demands. High resolution, wide-field lens, extra NA variability, plus reticle options. -High alignment accuracy for CMP processes. Two off-axis methods in addition to Canon's original technology문서
문서 없음
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
131681
웨이퍼 사이즈:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
CANON
FPA-3000i5+
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
131681
웨이퍼 사이즈:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Canon I-line lithography machine uses a 365nm wavelength light source for exposure. It is a key device for realizing the manufacturing of micron-level semiconductor devices. It has more excellent alignment accuracy and is widely used in the production of 4-inch, 6-inch, 8-inch and 12-inch wafers.환경 설정
0.35 0.45~0.63 5:1 22*26 50OEM 모델 설명
The FPA-3000i5+ is a high productivity mix-and-match partner with Canon excimer series scanners and steppers. Wide-field lens with extra NA variability supports a variety of fine patterning processes. This highly proven and successful veteran of the Canon stepper line-up has been a best-selling product since its release in 1996. Features: -Supports varieties of fine pattern demands. High resolution, wide-field lens, extra NA variability, plus reticle options. -High alignment accuracy for CMP processes. Two off-axis methods in addition to Canon's original technology문서
문서 없음