설명
FPA-5000ES2+ (KrF)환경 설정
환경 설정 없음OEM 모델 설명
The FPA-5000ES2+ is a high-throughput 248-nanometer scanner for 0.15-micron ICs, introduced by Canon U.S.A. Inc.'s Semiconductor Equipment Division. It uses a 2-kilohertz, krypton-fluoride (KrF) excimer laser to expose 125 eight-inch wafers an hour and is aimed at a growing need for highly productive scanners with both 200- and 300-mm wafer capability. It has been designed to handle both 0.18- and 0.15-micron design rules, and allows field conversion from 200-mm to 300-mm wafer format within a day. It offers a 25% increase in throughput compared with its predecessor, the FPA-5000ES2.문서
문서 없음
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
109624
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CANON
FPA-5000ES2+
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
109624
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
FPA-5000ES2+ (KrF)환경 설정
환경 설정 없음OEM 모델 설명
The FPA-5000ES2+ is a high-throughput 248-nanometer scanner for 0.15-micron ICs, introduced by Canon U.S.A. Inc.'s Semiconductor Equipment Division. It uses a 2-kilohertz, krypton-fluoride (KrF) excimer laser to expose 125 eight-inch wafers an hour and is aimed at a growing need for highly productive scanners with both 200- and 300-mm wafer capability. It has been designed to handle both 0.18- and 0.15-micron design rules, and allows field conversion from 200-mm to 300-mm wafer format within a day. It offers a 25% increase in throughput compared with its predecessor, the FPA-5000ES2.문서
문서 없음