설명
Canon I-line lithography machine uses a 365nm wavelength light source for exposure. It is a key device for realizing the manufacturing of micron-level semiconductor devices. It has more excellent alignment accuracy and is widely used in the production of 4-inch, 6-inch, 8-inch and 12-inch wafers.환경 설정
0.35 0.45~0.57 4:1 26*33 45OEM 모델 설명
FPA-5500iZ large-field i-line stepper for lowest CoO on non-critical layers. This high-productivity 365nm step-and-repeat system matches existing KrF/ArF scanner fields (26x33mm) for low-cost rough layer exposure.문서
문서 없음
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
131684
웨이퍼 사이즈:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CANON
FPA-5500iZ+
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
131684
웨이퍼 사이즈:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Canon I-line lithography machine uses a 365nm wavelength light source for exposure. It is a key device for realizing the manufacturing of micron-level semiconductor devices. It has more excellent alignment accuracy and is widely used in the production of 4-inch, 6-inch, 8-inch and 12-inch wafers.환경 설정
0.35 0.45~0.57 4:1 26*33 45OEM 모델 설명
FPA-5500iZ large-field i-line stepper for lowest CoO on non-critical layers. This high-productivity 365nm step-and-repeat system matches existing KrF/ArF scanner fields (26x33mm) for low-cost rough layer exposure.문서
문서 없음