설명
System Issues: 1.wafer stage leakage power off 2.reticle changer robot arm damaged 3. Reticle pre-align stage damaged 4.Computer damaged Cymer XLA 130 laser 1.Cymer chamber(MO/PA) damaged환경 설정
ArF scanner (4X) Includes a Canon FPA-60000AS4 main body, Cymer laser, and chiller.OEM 모델 설명
The FPA-6000AS4 is an ArF scanner that is the industry’s fastest and has the highest NA (0.85). It can project features as small as 85nm and is built on Canon’s new 140-wph, F2-capable FPA-6000 single-stage platform. It provides a cost-optimized solution for high volume 300mm or 200mm exposure processes for leading-edge device manufacturers choosing a mix-and-match strategy. The scanner has a 0.85-NA, 4:1 reduction lens system and is capable of 85-nanometer resolution with an overlay precision of 18nm.문서
문서 없음
CANON
FPA-6000AS4
검증됨
카테고리
Steppers & Scanners
마지막 검증일: 13일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Installed / Down
제품 ID:
115821
웨이퍼 사이즈:
알 수 없음
빈티지:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CANON
FPA-6000AS4
카테고리
Steppers & Scanners
마지막 검증일: 13일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Installed / Down
제품 ID:
115821
웨이퍼 사이즈:
알 수 없음
빈티지:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
System Issues: 1.wafer stage leakage power off 2.reticle changer robot arm damaged 3. Reticle pre-align stage damaged 4.Computer damaged Cymer XLA 130 laser 1.Cymer chamber(MO/PA) damaged환경 설정
ArF scanner (4X) Includes a Canon FPA-60000AS4 main body, Cymer laser, and chiller.OEM 모델 설명
The FPA-6000AS4 is an ArF scanner that is the industry’s fastest and has the highest NA (0.85). It can project features as small as 85nm and is built on Canon’s new 140-wph, F2-capable FPA-6000 single-stage platform. It provides a cost-optimized solution for high volume 300mm or 200mm exposure processes for leading-edge device manufacturers choosing a mix-and-match strategy. The scanner has a 0.85-NA, 4:1 reduction lens system and is capable of 85-nanometer resolution with an overlay precision of 18nm.문서
문서 없음