
설명
5x Reduction Stepper환경 설정
* The GCA AutoStep 200 Stepper is an I-line 5x reduction stepper with repeat exposure capabilities. It is capable of submicron resolution and high accuracy alignment. * 21 mm dia exposure field (up to 14.8 X 14.8 mm square) * Can achieve resolution < 600 nm * 200 mm wafer stage * Stage precision < 100 nm * Accommodates wafer sizes from 1 cm pieces to 6” wafers * Automatic reticle transfer alignment through RMS (reticle management system) * Exposure wavelength of 365 nmOEM 모델 설명
미제공문서
문서 없음
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
131961
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
GCA
AutoStep 200
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
131961
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
5x Reduction Stepper환경 설정
* The GCA AutoStep 200 Stepper is an I-line 5x reduction stepper with repeat exposure capabilities. It is capable of submicron resolution and high accuracy alignment. * 21 mm dia exposure field (up to 14.8 X 14.8 mm square) * Can achieve resolution < 600 nm * 200 mm wafer stage * Stage precision < 100 nm * Accommodates wafer sizes from 1 cm pieces to 6” wafers * Automatic reticle transfer alignment through RMS (reticle management system) * Exposure wavelength of 365 nmOEM 모델 설명
미제공문서
문서 없음