설명
설명 없음환경 설정
Illumination WL i-line Illumination uniformity 2.00% or CD unifotmity 400nm Overlay (single machine) 70nm Wafer capacity 3"/2" Reticle compatibility Available Reticle size 5" Lens reduction 1/5OEM 모델 설명
The NSR-2205i11D offers a resolution of 350nm or better and features a numerical aperture (NA) of 0.63. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system is equipped with the LSA alignment system as standard, and optionally offers the FIA and LIA alignment systems.문서
문서 없음
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
131913
웨이퍼 사이즈:
알 수 없음
빈티지:
1997
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
NIKON
NSR-2205i11D
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
131913
웨이퍼 사이즈:
알 수 없음
빈티지:
1997
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Illumination WL i-line Illumination uniformity 2.00% or CD unifotmity 400nm Overlay (single machine) 70nm Wafer capacity 3"/2" Reticle compatibility Available Reticle size 5" Lens reduction 1/5OEM 모델 설명
The NSR-2205i11D offers a resolution of 350nm or better and features a numerical aperture (NA) of 0.63. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system is equipped with the LSA alignment system as standard, and optionally offers the FIA and LIA alignment systems.문서
문서 없음