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NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
설명
-Currently installed in demonstration cleanroom in working condition.
환경 설정
• High Throughput A New illuminator design, along with a reduced stepping and alignment time, allows a high throughput of 103 wafers per hour (for 200mm wafers). • High Resolution and Modified Illumination The NSR-2205i14E2 with a projection lens with a top N.A. of 0.63 which, taken with modified illumination technology, enables resolution of 0.35μm or better. With Resolution Enhanced Technology (RET) and variable-N.A. reticle design, the systemcan handle a wide range of process parameters and diverse process requirements, including rough and middle layers. • Overall Alignment Accuracy The i14E2’s reticle interferometer system improves alignment accuracy, including chip rotation correction and staging accuracy. Thanks to enhanced baseline measurement and internal chip accuracy (chip magnification, chip rotation),overlay has been significantly improved. • Refined Operation Interface The operation has been enhanced through software improvements. An extensive lineup of measurement evaluation and maintenance software provides the right answer for all your requirements. Specifications Resolution: 0.35μm or better N.A.: 0.63 Exposure light source: i line Reduction ratio:1:5 Exposure field size: 22mm square to 17.9 (H) x 25.2 (V)mm Alignment accuracy (EGA, |x|+3σ):40nm or better Alignment system:LSA(standard), FIA(standard), LIA(optional)
OEM 모델 설명
For 350 nm Device Mass Production Thanks to the employment of new, highly enhanced illumination, along with a reduction in stepping and alignment time, the NSR-2205i14E2 features a high throughput of 103 wafers per hour (for 200 mm wafers).
문서

문서 없음

카테고리
Steppers & Scanners

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

42825


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

NIKON

NSR-2205i14E2

verified-listing-icon
검증됨
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
listing-photo-9e2d052ed2874fc28f4b445e16c5cb42-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/9626/9e2d052ed2874fc28f4b445e16c5cb42/aff659dfab8b45a798030badc3a1e646_screenshot20210802184349_mw.png
listing-photo-9e2d052ed2874fc28f4b445e16c5cb42-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/9626/9e2d052ed2874fc28f4b445e16c5cb42/123161fe5c04439c8e03994da90dc640_screenshot20210802184428_mw.png
listing-photo-9e2d052ed2874fc28f4b445e16c5cb42-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/9626/9e2d052ed2874fc28f4b445e16c5cb42/5a7d9db616ba4d0dab20856c09c9613d_screenshot20210802184454_mw.png
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

42825


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
-Currently installed in demonstration cleanroom in working condition.
환경 설정
• High Throughput A New illuminator design, along with a reduced stepping and alignment time, allows a high throughput of 103 wafers per hour (for 200mm wafers). • High Resolution and Modified Illumination The NSR-2205i14E2 with a projection lens with a top N.A. of 0.63 which, taken with modified illumination technology, enables resolution of 0.35μm or better. With Resolution Enhanced Technology (RET) and variable-N.A. reticle design, the systemcan handle a wide range of process parameters and diverse process requirements, including rough and middle layers. • Overall Alignment Accuracy The i14E2’s reticle interferometer system improves alignment accuracy, including chip rotation correction and staging accuracy. Thanks to enhanced baseline measurement and internal chip accuracy (chip magnification, chip rotation),overlay has been significantly improved. • Refined Operation Interface The operation has been enhanced through software improvements. An extensive lineup of measurement evaluation and maintenance software provides the right answer for all your requirements. Specifications Resolution: 0.35μm or better N.A.: 0.63 Exposure light source: i line Reduction ratio:1:5 Exposure field size: 22mm square to 17.9 (H) x 25.2 (V)mm Alignment accuracy (EGA, |x|+3σ):40nm or better Alignment system:LSA(standard), FIA(standard), LIA(optional)
OEM 모델 설명
For 350 nm Device Mass Production Thanks to the employment of new, highly enhanced illumination, along with a reduction in stepping and alignment time, the NSR-2205i14E2 features a high throughput of 103 wafers per hour (for 200 mm wafers).
문서

문서 없음