설명
Nikon KrF lithography machines use 248nm wavelength KrF excimer lasers as exposure light sources, which are suitable for more sophisticated semiconductor processes and are widely used in the manufacture of high-performance semiconductor devices, including microprocessors, dynamic random access memory (DRAM), and complex logic and mixed signal chips. These lithography machines are key equipment for achieving high-precision semiconductor device manufacturing, and play an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.환경 설정
0.20 0.68 4:1 25*33 FIA:50OEM 모델 설명
Stepper. NSR-S203B (resolution ≦ 180 nm). Ability to mass manufacture ICs with ultra-high-precision circuitry–specifically, sub-0.18µm minimum-pattern linewidth.문서
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NIKON
NSR-S203B
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
131671
웨이퍼 사이즈:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Nikon KrF lithography machines use 248nm wavelength KrF excimer lasers as exposure light sources, which are suitable for more sophisticated semiconductor processes and are widely used in the manufacture of high-performance semiconductor devices, including microprocessors, dynamic random access memory (DRAM), and complex logic and mixed signal chips. These lithography machines are key equipment for achieving high-precision semiconductor device manufacturing, and play an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.환경 설정
0.20 0.68 4:1 25*33 FIA:50OEM 모델 설명
Stepper. NSR-S203B (resolution ≦ 180 nm). Ability to mass manufacture ICs with ultra-high-precision circuitry–specifically, sub-0.18µm minimum-pattern linewidth.문서
문서 없음