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설명
This Nikon 2nd Relay Rear Optic Lens is used working surplus. The physical condition is good, with no signs of previous use and handling. Removed from a Nikon NSR-S204B Step-and-Repeat Scanning System. No scratches, dents or stripped threading.. Email or text for more pictures.환경 설정
Part No: 2nd Relay Rear Optic Lens 4K801-189 Non-Copper Removed from a Nikon NSR-S204B Step-and-Repeat Scanning System Made in JapanOEM 모델 설명
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.문서
문서 없음
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
Deinstalled
제품 ID:
120257
웨이퍼 사이즈:
2"/50mm
HDD / Software:
Yes
HDD / Software:
Yes
Process Node:
1
Exposure:
1
Lens Data:
1
빈티지:
1
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
NIKON
NSR-S204B
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
Deinstalled
제품 ID:
120257
웨이퍼 사이즈:
2"/50mm
HDD / Software:
Yes
HDD / Software:
Yes
Process Node:
1
Exposure:
1
Lens Data:
1
빈티지:
1
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
This Nikon 2nd Relay Rear Optic Lens is used working surplus. The physical condition is good, with no signs of previous use and handling. Removed from a Nikon NSR-S204B Step-and-Repeat Scanning System. No scratches, dents or stripped threading.. Email or text for more pictures.환경 설정
Part No: 2nd Relay Rear Optic Lens 4K801-189 Non-Copper Removed from a Nikon NSR-S204B Step-and-Repeat Scanning System Made in JapanOEM 모델 설명
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.문서
문서 없음