설명
설명 없음환경 설정
- 6" reticle - Resolution: 0.4um or less - N.A.: 0.5 - Exposed light source: i-line (wavelength = 365nm) - Exposure range: 25x33mm - Alignment accuracy: 45nm or less (M + 3 sigma) - Throughput: 120 wafers / hour (200mm wafer), 80 wafers / hour (300mm wafer, approximately) - Reduction ratio: 1:4OEM 모델 설명
The NIKON NSR SF100 is a Steppers and Scanners system. The NSR SF100 can be used with Wafer Size of 8”. The NSR SF100 design predicts the line configuration for 2001 and beyond, and responds with a high throughput of 80 plus wafers/hour on full-scale production lines using 300 mm wafers.문서
문서 없음
NIKON
NSR-SF100
검증됨
카테고리
Steppers & Scanners
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
112206
웨이퍼 사이즈:
8"/200mm
빈티지:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NIKON
NSR-SF100
카테고리
Steppers & Scanners
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
112206
웨이퍼 사이즈:
8"/200mm
빈티지:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
- 6" reticle - Resolution: 0.4um or less - N.A.: 0.5 - Exposed light source: i-line (wavelength = 365nm) - Exposure range: 25x33mm - Alignment accuracy: 45nm or less (M + 3 sigma) - Throughput: 120 wafers / hour (200mm wafer), 80 wafers / hour (300mm wafer, approximately) - Reduction ratio: 1:4OEM 모델 설명
The NIKON NSR SF100 is a Steppers and Scanners system. The NSR SF100 can be used with Wafer Size of 8”. The NSR SF100 design predicts the line configuration for 2001 and beyond, and responds with a high throughput of 80 plus wafers/hour on full-scale production lines using 300 mm wafers.문서
문서 없음