설명
i-Line Wide-Field Stepper환경 설정
Tool is operating in clean room. Labelled as Collateral Asset. Pictures: Please see. Configurations will be provided. Additional performance data will be collected. Missing or damaged parts: Not reported.OEM 모델 설명
NSR-SF130, a scan-field i-line stepper with high throughput and extremely low cost of ownership. The system makes use of leading-edge lens technology to achieve the same wide exposure field (26×33 mm) as DUV scanners, making it ideal for mix and match applications. The NSR-SF130, Nikon’s fifth new semiconductor systems announced in 2003, achieves a resolution of 280 nm or better and boasts a throughput of 120 wafers/hour for 300 mm wafers. The system combines superior performance with the lowest cost of ownership to help reduce semiconductor manufacturing costs.문서
문서 없음
NIKON
NSR-SF130
검증됨
카테고리
Steppers & Scanners
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
11980
웨이퍼 사이즈:
12"/300mm
빈티지:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
NIKON
NSR-SF130
카테고리
Steppers & Scanners
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
11980
웨이퍼 사이즈:
12"/300mm
빈티지:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
i-Line Wide-Field Stepper환경 설정
Tool is operating in clean room. Labelled as Collateral Asset. Pictures: Please see. Configurations will be provided. Additional performance data will be collected. Missing or damaged parts: Not reported.OEM 모델 설명
NSR-SF130, a scan-field i-line stepper with high throughput and extremely low cost of ownership. The system makes use of leading-edge lens technology to achieve the same wide exposure field (26×33 mm) as DUV scanners, making it ideal for mix and match applications. The NSR-SF130, Nikon’s fifth new semiconductor systems announced in 2003, achieves a resolution of 280 nm or better and boasts a throughput of 120 wafers/hour for 300 mm wafers. The system combines superior performance with the lowest cost of ownership to help reduce semiconductor manufacturing costs.문서
문서 없음