메인 콘텐츠로 건너뛰기
Moov logo

Moov Icon
VEECO / ULTRATECH SATURN SPECTRUM 3
    설명
    설명 없음
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Ultratech Saturn Spectrum 3 is a stepper and scanner system utilized in the production of semiconductor devices. It is capable of manufacturing wafers in sizes ranging from 4 to 8 inches. Ultratech also offers an updated version of this system, the Saturn Spectrum 3e, which incorporates an enhanced machine vision system (MVS) that includes the PatMAX architecture. The Saturn Spectrum 3e also boasts improved illumination, with a wafer plane irradiance of 1900 mW/cm2, resulting in shorter exposure times.
    문서

    문서 없음

    카테고리
    Steppers & Scanners

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    112107


    웨이퍼 사이즈:

    6"/150mm


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    VEECO / ULTRATECH

    SATURN SPECTRUM 3

    verified-listing-icon
    검증됨
    카테고리
    Steppers & Scanners
    마지막 검증일: 60일 이상 전
    listing-photo-a0c00b42c43441bc95c84b183debf47a-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    112107


    웨이퍼 사이즈:

    6"/150mm


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Ultratech Saturn Spectrum 3 is a stepper and scanner system utilized in the production of semiconductor devices. It is capable of manufacturing wafers in sizes ranging from 4 to 8 inches. Ultratech also offers an updated version of this system, the Saturn Spectrum 3e, which incorporates an enhanced machine vision system (MVS) that includes the PatMAX architecture. The Saturn Spectrum 3e also boasts improved illumination, with a wafer plane irradiance of 1900 mW/cm2, resulting in shorter exposure times.
    문서

    문서 없음