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설명
*.Installed in a clean room and can demonstrate any time.환경 설정
*.Measurement -Speed: 5 sec. for 150mm wafer. -Range: 2x10E7 ~ 4x10E7 dyne/cm2 -RMS Noise: 0.0001 mE-1(radius=10,000 meters) -Resolution:0.00003mE-1(33 kilometers) -Min scan setp: 0.02mm -Max Points Per Scan: 1250 -Min Radius: 2.0m(for 80mm scan length) -Temperature Range: room temperature ~ 500 C *.Light Source: 670nm(3mW), 750nm(3mW) Laser. *.Dimension: 46cm(18")x46cm(18")x56cm(22") plus computer. *.Weight: 45.5Kg *.Utility -Operation temperature: 18~22 C(64~72F) -Gas Connection: Cooling gas(Nitrogen, Class 100 Air) -Power: 115V, 11A, 50/60Hz -Computer: Pentium 200Mhz,32MB RAM, 3GB HDD, 17" LCD Monitor.OEM 모델 설명
The Tencor FLX-2320 is an equipment that accurately measures film stress at temperatures from -65°C to 500°C, using dual wavelength technology to work on all types of films, including transparent ones like silicon nitride. This helps better understand film properties in simulated process environments.문서
문서 없음
유사 등재물
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KLA
FLX 2320
카테고리
Thin Film / Film Thickness
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
66000
웨이퍼 사이즈:
6"/150mm
빈티지:
1993
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설명
*.Installed in a clean room and can demonstrate any time.환경 설정
*.Measurement -Speed: 5 sec. for 150mm wafer. -Range: 2x10E7 ~ 4x10E7 dyne/cm2 -RMS Noise: 0.0001 mE-1(radius=10,000 meters) -Resolution:0.00003mE-1(33 kilometers) -Min scan setp: 0.02mm -Max Points Per Scan: 1250 -Min Radius: 2.0m(for 80mm scan length) -Temperature Range: room temperature ~ 500 C *.Light Source: 670nm(3mW), 750nm(3mW) Laser. *.Dimension: 46cm(18")x46cm(18")x56cm(22") plus computer. *.Weight: 45.5Kg *.Utility -Operation temperature: 18~22 C(64~72F) -Gas Connection: Cooling gas(Nitrogen, Class 100 Air) -Power: 115V, 11A, 50/60Hz -Computer: Pentium 200Mhz,32MB RAM, 3GB HDD, 17" LCD Monitor.OEM 모델 설명
The Tencor FLX-2320 is an equipment that accurately measures film stress at temperatures from -65°C to 500°C, using dual wavelength technology to work on all types of films, including transparent ones like silicon nitride. This helps better understand film properties in simulated process environments.문서
문서 없음