설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The CLEAN TRACK LITHIUS i+ is a 300-mm/200-mm coater/developer designed for technology nodes 45-nm and beyond. It was developed based on three concepts: improved processing, short cycle times, and enhanced network solutions. The system achieves increased responsiveness and stability for important process technologies, shorter lead and start-up times, and allows for easier modifications. It is designed with a metrology integration block and offers an increased network capability that integrates various advanced network technologies, such as eDiagnostics and APC. The CLEAN TRACK LITHIUS i+ supports a throughput of 150 WPH (wafer per hour) and features a thermally isolated design that minimizes thermal interference. It comes standard with the core network solution “Ingenio,” a data analysis platform, and allows for full system integration of measurement and inspection tools. The CLEAN TRACK LITHIUS i+ is specifically developed for immersion technology and is suitable for lithography processes such as ArF immersion, ArF, KrF, and i-line.문서
문서 없음
TEL / TOKYO ELECTRON
LITHIUS i+
검증됨
카테고리
Coaters & Developers
마지막 검증일: 9일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
119328
웨이퍼 사이즈:
12"/300mm
빈티지:
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
TEL / TOKYO ELECTRON
LITHIUS i+
카테고리
Coaters & Developers
마지막 검증일: 9일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
119328
웨이퍼 사이즈:
12"/300mm
빈티지:
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The CLEAN TRACK LITHIUS i+ is a 300-mm/200-mm coater/developer designed for technology nodes 45-nm and beyond. It was developed based on three concepts: improved processing, short cycle times, and enhanced network solutions. The system achieves increased responsiveness and stability for important process technologies, shorter lead and start-up times, and allows for easier modifications. It is designed with a metrology integration block and offers an increased network capability that integrates various advanced network technologies, such as eDiagnostics and APC. The CLEAN TRACK LITHIUS i+ supports a throughput of 150 WPH (wafer per hour) and features a thermally isolated design that minimizes thermal interference. It comes standard with the core network solution “Ingenio,” a data analysis platform, and allows for full system integration of measurement and inspection tools. The CLEAN TRACK LITHIUS i+ is specifically developed for immersion technology and is suitable for lithography processes such as ArF immersion, ArF, KrF, and i-line.문서
문서 없음