설명
TRACK환경 설정
(5C/ 5D) (for Nikon S609B Immersion Scanner)OEM 모델 설명
The CLEAN TRACK LITHIUS i+ is a 300-mm/200-mm coater/developer designed for technology nodes 45-nm and beyond. It was developed based on three concepts: improved processing, short cycle times, and enhanced network solutions. The system achieves increased responsiveness and stability for important process technologies, shorter lead and start-up times, and allows for easier modifications. It is designed with a metrology integration block and offers an increased network capability that integrates various advanced network technologies, such as eDiagnostics and APC. The CLEAN TRACK LITHIUS i+ supports a throughput of 150 WPH (wafer per hour) and features a thermally isolated design that minimizes thermal interference. It comes standard with the core network solution “Ingenio,” a data analysis platform, and allows for full system integration of measurement and inspection tools. The CLEAN TRACK LITHIUS i+ is specifically developed for immersion technology and is suitable for lithography processes such as ArF immersion, ArF, KrF, and i-line.문서
문서 없음
TEL / TOKYO ELECTRON
LITHIUS i+
검증됨
카테고리
Coaters & Developers
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
75743
웨이퍼 사이즈:
12"/300mm
빈티지:
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
TEL / TOKYO ELECTRON
LITHIUS i+
카테고리
Coaters & Developers
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
75743
웨이퍼 사이즈:
12"/300mm
빈티지:
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
TRACK환경 설정
(5C/ 5D) (for Nikon S609B Immersion Scanner)OEM 모델 설명
The CLEAN TRACK LITHIUS i+ is a 300-mm/200-mm coater/developer designed for technology nodes 45-nm and beyond. It was developed based on three concepts: improved processing, short cycle times, and enhanced network solutions. The system achieves increased responsiveness and stability for important process technologies, shorter lead and start-up times, and allows for easier modifications. It is designed with a metrology integration block and offers an increased network capability that integrates various advanced network technologies, such as eDiagnostics and APC. The CLEAN TRACK LITHIUS i+ supports a throughput of 150 WPH (wafer per hour) and features a thermally isolated design that minimizes thermal interference. It comes standard with the core network solution “Ingenio,” a data analysis platform, and allows for full system integration of measurement and inspection tools. The CLEAN TRACK LITHIUS i+ is specifically developed for immersion technology and is suitable for lithography processes such as ArF immersion, ArF, KrF, and i-line.문서
문서 없음