설명
TEL COATER M?환경 설정
환경 설정 없음OEM 모델 설명
The CLEAN TRACK™ Mark-II is a coater/developer system developed by TEL. It is an advanced version of the first domestic model, the CLEAN TRACK™ Mark, which was based on a photoresist system developed and manufactured in the US. The Mark-II was able to transition to larger wafer sizes of up to 6 inches and featured an advanced controller. Through multiple efforts, such as introducing in-line models with exposure tools, the system’s productivity was continuously improved.문서
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TEL / TOKYO ELECTRON
MARK II
검증됨
카테고리
Coaters & Developers
마지막 검증일: 25일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
117330
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
TEL / TOKYO ELECTRON
MARK II
카테고리
Coaters & Developers
마지막 검증일: 25일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
117330
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
TEL COATER M?환경 설정
환경 설정 없음OEM 모델 설명
The CLEAN TRACK™ Mark-II is a coater/developer system developed by TEL. It is an advanced version of the first domestic model, the CLEAN TRACK™ Mark, which was based on a photoresist system developed and manufactured in the US. The Mark-II was able to transition to larger wafer sizes of up to 6 inches and featured an advanced controller. Through multiple efforts, such as introducing in-line models with exposure tools, the system’s productivity was continuously improved.문서
문서 없음