설명
설명 없음환경 설정
Track Configuration Coat cups- 2 Developer cups- 3 ADH (TAD)- 2 Resist reduction- RRC Developer nozzle- SH Oven Configuration PEB- CLHP x4 COT- CLHP x3 / HCP x2 DEV- HCP x1 Stepper- HCP x2 Post bake- LHP x4 Resist & Chemicals Resist pump- RDS 4 ml, 10 ml Resist supply- Gallon bottle Thinner- OK73OEM 모델 설명
The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.문서
문서 없음
카테고리
Coaters & Developers
마지막 검증일: 2일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
150243
웨이퍼 사이즈:
12"/300mm
빈티지:
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
TEL / TOKYO ELECTRON
LITHIUS Pro Z
카테고리
Coaters & Developers
마지막 검증일: 2일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
150243
웨이퍼 사이즈:
12"/300mm
빈티지:
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Track Configuration Coat cups- 2 Developer cups- 3 ADH (TAD)- 2 Resist reduction- RRC Developer nozzle- SH Oven Configuration PEB- CLHP x4 COT- CLHP x3 / HCP x2 DEV- HCP x1 Stepper- HCP x2 Post bake- LHP x4 Resist & Chemicals Resist pump- RDS 4 ml, 10 ml Resist supply- Gallon bottle Thinner- OK73OEM 모델 설명
The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.문서
문서 없음