설명
System dimensions (cm): 80x85 x188 Weight : 330 Kg환경 설정
-Capable of 4"-8" wafers. -Non-patterned surface Inspection System. -0.12 micron Defect Sensitivity @ 95% capture, based on PSL Standards. -0.02 ppm Haze Sensitivity. -Waves Length 488 nm, 30mw ArLaser, Blue Laser , Spot Size 90µ; -Scan Frequency 170 Hz; Scan Pitch: 10,20 and 40µ; -Throughput 120/6" wph -Single puck handling from single cassette or platform -Win 98 software, CD ROM Writer software version: 4. 2 -XY coordinates, GEM SECS: options availableOEM 모델 설명
The Surfscan 6420 detects submicron defects on metal films and rough surfaces but still provides sensitivity down to 0.1 micron on polished silicon. It is effective for detecting defects on non-uniform films, a critical requirement for CMP applications.문서
문서 없음
KLA
SURFSCAN 6420
검증됨
카테고리
Defect Inspection
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
113497
웨이퍼 사이즈:
4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm
빈티지:
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
KLA
SURFSCAN 6420
카테고리
Defect Inspection
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
113497
웨이퍼 사이즈:
4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm
빈티지:
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
System dimensions (cm): 80x85 x188 Weight : 330 Kg환경 설정
-Capable of 4"-8" wafers. -Non-patterned surface Inspection System. -0.12 micron Defect Sensitivity @ 95% capture, based on PSL Standards. -0.02 ppm Haze Sensitivity. -Waves Length 488 nm, 30mw ArLaser, Blue Laser , Spot Size 90µ; -Scan Frequency 170 Hz; Scan Pitch: 10,20 and 40µ; -Throughput 120/6" wph -Single puck handling from single cassette or platform -Win 98 software, CD ROM Writer software version: 4. 2 -XY coordinates, GEM SECS: options availableOEM 모델 설명
The Surfscan 6420 detects submicron defects on metal films and rough surfaces but still provides sensitivity down to 0.1 micron on polished silicon. It is effective for detecting defects on non-uniform films, a critical requirement for CMP applications.문서
문서 없음