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TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
  • TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
  • TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
  • TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
  • TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
  • TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
  • TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
  • TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
  • TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
  • TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
  • TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
  • TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
설명
설명 없음
환경 설정
Three Port Loader (MISSING ROBOT) Main Body Four Chamber with Heater Power Rack HD include
OEM 모델 설명
The Triase+™ EX-II™ TiN (Titanium Nitride) is an advanced 300mm single wafer deposition system for high speed ASFD which enables high-quality thin film formation with excellent within-wafer uniformity and high step coverage characteristics. Featuring an optimized reactor design with new gas injection module, the system achieves high productivity even in the leading-edge semiconductor device manufacturing, and is used for various applications including formation of contact barriers, capacitor electrodes, word line barriers and metal gates.
문서

문서 없음

카테고리
Deposition

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

123108


웨이퍼 사이즈:

12"/300mm


빈티지:

2018


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

TEL / TOKYO ELECTRON

TRIASe+ EX-II TiN

verified-listing-icon
검증됨
카테고리
Deposition
마지막 검증일: 60일 이상 전
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listing-photo-599409e01098457db24982c82a9322d1-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/599409e01098457db24982c82a9322d1/eae48733ba264cbf920517f1f2e7b038_8b03c576f05f49b89ffbcf113c357d65_mw.jpeg
listing-photo-599409e01098457db24982c82a9322d1-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/599409e01098457db24982c82a9322d1/a21e39e9201441358a308e80610e3df8_b46d0924c052462ea3562c6995efc761_mw.png
listing-photo-599409e01098457db24982c82a9322d1-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/599409e01098457db24982c82a9322d1/0a69480340194074a54c201f74856582_2e47c2173cf8427099ad273aaa663136_mw.jpeg
listing-photo-599409e01098457db24982c82a9322d1-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/599409e01098457db24982c82a9322d1/32915ed111ef43999b2f58080204a545_ef0bb9b2872e47f1b45802797c86220f_mw.jpeg
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

123108


웨이퍼 사이즈:

12"/300mm


빈티지:

2018


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음
환경 설정
Three Port Loader (MISSING ROBOT) Main Body Four Chamber with Heater Power Rack HD include
OEM 모델 설명
The Triase+™ EX-II™ TiN (Titanium Nitride) is an advanced 300mm single wafer deposition system for high speed ASFD which enables high-quality thin film formation with excellent within-wafer uniformity and high step coverage characteristics. Featuring an optimized reactor design with new gas injection module, the system achieves high productivity even in the leading-edge semiconductor device manufacturing, and is used for various applications including formation of contact barriers, capacitor electrodes, word line barriers and metal gates.
문서

문서 없음