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TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
    설명
    설명 없음
    환경 설정
    Three Port Loader Main Body (MISSING ROBOT) Four Chamber with Heater Power Rack HD include
    OEM 모델 설명
    The Triase+™ EX-II™ TiN (Titanium Nitride) is an advanced 300mm single wafer deposition system for high speed ASFD which enables high-quality thin film formation with excellent within-wafer uniformity and high step coverage characteristics. Featuring an optimized reactor design with new gas injection module, the system achieves high productivity even in the leading-edge semiconductor device manufacturing, and is used for various applications including formation of contact barriers, capacitor electrodes, word line barriers and metal gates.
    문서

    문서 없음

    카테고리
    Deposition

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    123107


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2015


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    TEL / TOKYO ELECTRON

    TRIASe+ EX-II TiN

    verified-listing-icon
    검증됨
    카테고리
    Deposition
    마지막 검증일: 60일 이상 전
    listing-photo-8a60f5b690384500860f7d1962822921-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/8a60f5b690384500860f7d1962822921/7b38c5c165924e9ca02ae7a439f4f6dd_1b364f357e254d3ea8be86c661b78404_mw.png
    listing-photo-8a60f5b690384500860f7d1962822921-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/8a60f5b690384500860f7d1962822921/d32ea10239e14d60940d04981a2015d2_2977e85ad86c4bdba078c43876d10ac4_mw.png
    listing-photo-8a60f5b690384500860f7d1962822921-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/8a60f5b690384500860f7d1962822921/a49f0de7194a4c30b2c9de938a319b79_45314f74bf254ae7a76615f693f0975c45005c_mw.jpeg
    listing-photo-8a60f5b690384500860f7d1962822921-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/8a60f5b690384500860f7d1962822921/08b9c3a8a83648b59c941479fcebaecf_8b3ad914701b412e9bb29374aaf2ac4445005c_mw.jpeg
    listing-photo-8a60f5b690384500860f7d1962822921-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/8a60f5b690384500860f7d1962822921/22182cc7a171429eb766e5378eb25e3c_b1921a49a1df433abdfaa251fdb23aa0_mw.png
    listing-photo-8a60f5b690384500860f7d1962822921-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/8a60f5b690384500860f7d1962822921/c5d8816bdd3f414394bb1c111b4deb55_8af81899418f439d87420f37e424002b45005c_mw.jpeg
    listing-photo-8a60f5b690384500860f7d1962822921-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/8a60f5b690384500860f7d1962822921/6cae8aeacd1f4a42acfdd2366a4c04d5_193be1360a034eba85fda4bc890c65ff_mw.png
    listing-photo-8a60f5b690384500860f7d1962822921-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/8a60f5b690384500860f7d1962822921/f8f241d40cb843fe864e3a79a108da85_1d601edcffb24ef88eeb06f8d2bef725_mw.jpeg
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    123107


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2015


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    Three Port Loader Main Body (MISSING ROBOT) Four Chamber with Heater Power Rack HD include
    OEM 모델 설명
    The Triase+™ EX-II™ TiN (Titanium Nitride) is an advanced 300mm single wafer deposition system for high speed ASFD which enables high-quality thin film formation with excellent within-wafer uniformity and high step coverage characteristics. Featuring an optimized reactor design with new gas injection module, the system achieves high productivity even in the leading-edge semiconductor device manufacturing, and is used for various applications including formation of contact barriers, capacitor electrodes, word line barriers and metal gates.
    문서

    문서 없음