설명
Vertical batch thermal processing system designed for 200mm semiconductor wafers환경 설정
Details Attached High Temp Oxide (HCLAR) General Information: System Layout: Main, Utility System Type: L Type Side Maintenance: Installed System Paint Color: Ivory Furnace Front Surface Finish: Ivory Heater Model: Rapid Cooling Unit: Not Installed N2 Load Lock: Not Installed O2 Analyzer: Not Installed Cassette I/O Type: Normal I/O Type (NOT SMIF) SMIF Maker/Model: Not Installed AGV Compatibility: Unable System Main Controller: WAVES Mechanical Controller: WAVES Sequence Controller: WAVES Gas Controller: WAVES Gas Flow Chart Panel: Installed (Front, Rear) Operation Panel: Installed (Front, Rear) Signal Tower / Colors: Not Installed Furnace Temperature Controller: Model 560A Furnace Overtemp Detector: FENWAL / DMR-5FR Gas Detector Maker / Model: Yes Detecting Gas Host Communications: SECS User Host Computer I/F Manual (Drawing, Parts list etc) Gas System: Process Gas: N2, O2, H2, HCL, AR Basic Style: Integrated Gas System (Fujikin) Manual Valve: NUPRO Air-Operated Valve: FUJIKIN Filter: MILLIPORE Regulator: VERIFLO MFC Maker / Model: STEC (7330, 7350, 7500) PT Sensor Maker / Model: VERIFLO DPM Maker / Model: VERIFLO Check Valve: NUPRO Baking System Liquid Source Auto-Refill Burn Controller: HEC PYRO CTL Vaporizer Vacuum & Exhaust System: Pump: N/A Pressure Control Valve: N/A Pressure Controller: N/A Pressure Sensor: N/A Trap: Not Installed Gas Cooler: N/A Wafer & Cassette Handling: Wafer Type: 200 mm Notch Type Auto Wafer Aligner: Installed (QTY 26) Wafer in Cassette (QTY 21) Cassette Storage Fork Type: 1+4 Fork-Wafer Presence Sensor: Installed Fork-Variable Pitch: Installed Magnetic Seal Rotation: Not InstalledOEM 모델 설명
The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.문서
카테고리
Furnaces / Diffusion
마지막 검증일: 어제
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
157198
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
TEL / TOKYO ELECTRON
ALPHA-8SE
카테고리
Furnaces / Diffusion
마지막 검증일: 어제
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
157198
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available