설명
SSM 5200 Automatic CV System for CV/QV/IV Fully automated capacitance-voltage(CV),charge-voltage(QV), and current-voltage(IV) system [Direct Measurement] - Accurately measure CV, QV and IV characteristics of MOS test structures in scribe lines on product wafers. [Pattern Recognition] - Vision system for fast pattern recognition for automatic placement of measurement probe. [Cassette-To-Cassette Loading/Unloading] - Robotic loading and unloading of wafers with flat or notch alignment. Fast - Effective oxide charge and carrier density measurements in 50seconds, ion implant dose in 20 seconds.환경 설정
환경 설정 없음OEM 모델 설명
The SSM 5200 is an off-line metrology system that measures a variety of electrical oxide and dielectric characteristics on monitor wafers. It can measure capacitive effective thickness and equivalent oxide thickness of advanced gate dielectrics less than 1 nanometer thick with high precision. It also includes a wide range of current voltage (IV) measurements such as leakage current, TDDB, and SILC. The SSM 5200 uses a small elastic probe to form a temporary gate on the dielectric surface and an integrated pattern recognition system to locate scribe line test areas. The elastic probe has a diameter of less than 30 µm and does not damage the dielectric surface.문서
문서 없음
SSM
5200
검증됨
카테고리
Metrology
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
17283
웨이퍼 사이즈:
8"/200mm
빈티지:
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SSM
5200
카테고리
Metrology
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
17283
웨이퍼 사이즈:
8"/200mm
빈티지:
1997
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
SSM 5200 Automatic CV System for CV/QV/IV Fully automated capacitance-voltage(CV),charge-voltage(QV), and current-voltage(IV) system [Direct Measurement] - Accurately measure CV, QV and IV characteristics of MOS test structures in scribe lines on product wafers. [Pattern Recognition] - Vision system for fast pattern recognition for automatic placement of measurement probe. [Cassette-To-Cassette Loading/Unloading] - Robotic loading and unloading of wafers with flat or notch alignment. Fast - Effective oxide charge and carrier density measurements in 50seconds, ion implant dose in 20 seconds.환경 설정
환경 설정 없음OEM 모델 설명
The SSM 5200 is an off-line metrology system that measures a variety of electrical oxide and dielectric characteristics on monitor wafers. It can measure capacitive effective thickness and equivalent oxide thickness of advanced gate dielectrics less than 1 nanometer thick with high precision. It also includes a wide range of current voltage (IV) measurements such as leakage current, TDDB, and SILC. The SSM 5200 uses a small elastic probe to form a temporary gate on the dielectric surface and an integrated pattern recognition system to locate scribe line test areas. The elastic probe has a diameter of less than 30 µm and does not damage the dielectric surface.문서
문서 없음