메인 콘텐츠로 건너뛰기
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 더 알아보기

Moov logo

Moov Icon
LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" SPEED
  • LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" SPEED
  • LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" SPEED
  • LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" SPEED
설명
설명 없음
환경 설정
AC power rack
OEM 모델 설명
The Novellus Concept Three Speed is an advanced system designed for 300 mm wafers, boasting a proprietary hemispherical ion source and bi-polar electrostatic chuck. These innovative features ensure superior ion uniformity and precise temperature control. Even as the elements are scaled up for 300 mm wafers, the ion uniformity remains consistent due to the inherent design characteristics of the ion source. Additionally, an optimized gas delivery system enhances the overall within-wafer uniformity, further improving the system's performance.
문서

문서 없음

카테고리
PECVD

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Parts Tool


작동 상태:

알 수 없음


제품 ID:

89354


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" SPEED

verified-listing-icon
검증됨
카테고리
PECVD
마지막 검증일: 60일 이상 전
listing-photo-57d71be40b844d4da47832f47e1c4aed-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
주요 품목 세부 정보

조건:

Parts Tool


작동 상태:

알 수 없음


제품 ID:

89354


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음
환경 설정
AC power rack
OEM 모델 설명
The Novellus Concept Three Speed is an advanced system designed for 300 mm wafers, boasting a proprietary hemispherical ion source and bi-polar electrostatic chuck. These innovative features ensure superior ion uniformity and precise temperature control. Even as the elements are scaled up for 300 mm wafers, the ion uniformity remains consistent due to the inherent design characteristics of the ion source. Additionally, an optimized gas delivery system enhances the overall within-wafer uniformity, further improving the system's performance.
문서

문서 없음