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OXFORD PLASMALAB 133
  • OXFORD PLASMALAB 133
  • OXFORD PLASMALAB 133
  • OXFORD PLASMALAB 133
  • OXFORD PLASMALAB 133
설명
설명 없음
환경 설정
Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:26 AMPS26 AMPS Dimensions: StandardMetric Overall:52 x 22 x 49 IN - 500 LBS1320.80 x 558.80 x 1244.60 mm - 226.80 kg
OEM 모델 설명
The Oxford Plasmalab 133 is a system used for plasma etching through a process called Reactive Ion Etching (RIE). This refurbished system is designed for GaN etching and has a platen that measures 330mm. It has an RF power of 600W at a frequency of 13.56MHz and features a water-cooled electrode that can operate within a temperature range of 10°C to 80°C. The system also includes a load lock with a turbo pump and an end-point detection system that utilizes Verity Optical emission spectroscopy within the range of 200-800nm. The gas pod of the system has six lines, including mass flow controllers for gases such as Ar, CL, BCL3, and N2O.
문서

문서 없음

카테고리
PECVD

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

41126


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

OXFORD

PLASMALAB 133

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검증됨
카테고리
PECVD
마지막 검증일: 60일 이상 전
listing-photo-396c6da0a5fb46cab7448a60a13fcd62-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/396c6da0a5fb46cab7448a60a13fcd62/8f5a026874874f76b31c9888b9cc6571_9b1985a75c794d85976480e38a2e1e871105c_mw.jpeg
listing-photo-396c6da0a5fb46cab7448a60a13fcd62-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/396c6da0a5fb46cab7448a60a13fcd62/9357a0c198e64914a6a0b5518e6fee85_afcdf732b75f482796eb3a9d29f75a8f1105c_mw.jpeg
listing-photo-396c6da0a5fb46cab7448a60a13fcd62-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/396c6da0a5fb46cab7448a60a13fcd62/940af5b10b614237999d5fff7d1b6089_f90b32971b1642f48d61b9aea3c249521201a_mw.jpeg
listing-photo-396c6da0a5fb46cab7448a60a13fcd62-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/396c6da0a5fb46cab7448a60a13fcd62/cfc4a69384e24959af3e1fb9620afc10_cb8c6e0d0ae442bf8ec61aea46093ab71201a_mw.jpeg
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

41126


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음
환경 설정
Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:26 AMPS26 AMPS Dimensions: StandardMetric Overall:52 x 22 x 49 IN - 500 LBS1320.80 x 558.80 x 1244.60 mm - 226.80 kg
OEM 모델 설명
The Oxford Plasmalab 133 is a system used for plasma etching through a process called Reactive Ion Etching (RIE). This refurbished system is designed for GaN etching and has a platen that measures 330mm. It has an RF power of 600W at a frequency of 13.56MHz and features a water-cooled electrode that can operate within a temperature range of 10°C to 80°C. The system also includes a load lock with a turbo pump and an end-point detection system that utilizes Verity Optical emission spectroscopy within the range of 200-800nm. The gas pod of the system has six lines, including mass flow controllers for gases such as Ar, CL, BCL3, and N2O.
문서

문서 없음