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OXFORD PLASMALAB 133
    설명
    설명 없음
    환경 설정
    Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:26 AMPS26 AMPS Dimensions: StandardMetric Overall:52 x 22 x 49 IN - 500 LBS1320.80 x 558.80 x 1244.60 mm - 226.80 kg
    OEM 모델 설명
    The Oxford Plasmalab 133 is a system used for plasma etching through a process called Reactive Ion Etching (RIE). This refurbished system is designed for GaN etching and has a platen that measures 330mm. It has an RF power of 600W at a frequency of 13.56MHz and features a water-cooled electrode that can operate within a temperature range of 10°C to 80°C. The system also includes a load lock with a turbo pump and an end-point detection system that utilizes Verity Optical emission spectroscopy within the range of 200-800nm. The gas pod of the system has six lines, including mass flow controllers for gases such as Ar, CL, BCL3, and N2O.
    문서

    문서 없음

    OXFORD

    PLASMALAB 133

    verified-listing-icon

    검증됨

    카테고리
    PECVD

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    41123


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    OXFORD PLASMALAB 133

    OXFORD

    PLASMALAB 133

    PECVD
    빈티지: 2010조건: 중고
    마지막 검증일60일 이상 전

    OXFORD

    PLASMALAB 133

    verified-listing-icon
    검증됨
    카테고리
    PECVD
    마지막 검증일: 60일 이상 전
    listing-photo-cc7c7dd596dc42baa27417d92d1b4220-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/cc7c7dd596dc42baa27417d92d1b4220/39d83ca59f3c4645a9c47fc8324cf096_209129104a7a41578d91a249e5cf7ffc1201a_mw.jpeg
    listing-photo-cc7c7dd596dc42baa27417d92d1b4220-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/cc7c7dd596dc42baa27417d92d1b4220/56c92079b1934c008fa1d385260e8023_629157d5226449ba80acfcc60ef464091201a_mw.jpeg
    listing-photo-cc7c7dd596dc42baa27417d92d1b4220-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/cc7c7dd596dc42baa27417d92d1b4220/529673e8ad90413f835a584a4db69224_fa5e92c85a6d4b069bf85eb2ac652aa51201a_mw.jpeg
    listing-photo-cc7c7dd596dc42baa27417d92d1b4220-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/cc7c7dd596dc42baa27417d92d1b4220/c909785727b04d9287f5f406320f27be_2c569a1f6dd5425da0f768777487d2bd1105c_mw.jpeg
    listing-photo-cc7c7dd596dc42baa27417d92d1b4220-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/cc7c7dd596dc42baa27417d92d1b4220/990a72549a444b49a25010829c14d5bd_1cef2f9565834061a0ebce6cc05905be1105c_mw.jpeg
    listing-photo-cc7c7dd596dc42baa27417d92d1b4220-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/cc7c7dd596dc42baa27417d92d1b4220/d3f1f077d13a4b03aa8d1372902e943d_7d2052e221b74c8c9733a01fa702665b1105c_mw.jpeg
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    41123


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:26 AMPS26 AMPS Dimensions: StandardMetric Overall:52 x 22 x 49 IN - 500 LBS1320.80 x 558.80 x 1244.60 mm - 226.80 kg
    OEM 모델 설명
    The Oxford Plasmalab 133 is a system used for plasma etching through a process called Reactive Ion Etching (RIE). This refurbished system is designed for GaN etching and has a platen that measures 330mm. It has an RF power of 600W at a frequency of 13.56MHz and features a water-cooled electrode that can operate within a temperature range of 10°C to 80°C. The system also includes a load lock with a turbo pump and an end-point detection system that utilizes Verity Optical emission spectroscopy within the range of 200-800nm. The gas pod of the system has six lines, including mass flow controllers for gases such as Ar, CL, BCL3, and N2O.
    문서

    문서 없음

    유사 등재물
    모두 보기
    OXFORD PLASMALAB 133

    OXFORD

    PLASMALAB 133

    PECVD빈티지: 2010조건: 중고마지막 검증일:60일 이상 전
    OXFORD PLASMALAB 133

    OXFORD

    PLASMALAB 133

    PECVD빈티지: 0조건: 중고마지막 검증일:60일 이상 전
    OXFORD PLASMALAB 133

    OXFORD

    PLASMALAB 133

    PECVD빈티지: 0조건: 중고마지막 검증일:60일 이상 전