EVATEC / UNAXIS / OERLIKON / BALZERS

CLUSTERLINE 200 

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Last processed 6” wafer was Oct’21, currently the tool is not running with power-off condition.

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The Clusterline 200 systems offeredis equipped with 5 single process chambers each. They were used only for reactive sputtering of SiO2 layers on 150mm blank Si wafers. Both systems are still in a clean room and in working conditions. Further devices mounted on these tools are: two vacuum loadports each, wafer aligners, buffer stations for upto 5 wafers, OCR back side readers.

Handler Type MX800.







5x Pulsed DC chambers with RF on Chuck

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Evatec Clusterline 200 ITO1
ITO Sputtering 

1. 2x Fortrend Plus500 
2. 1x EVS100P Ebara Pump 
3. 2x EVA06 Ebara Pump "

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PDSP03004_Evatec Clusterline.jpg

CLUSTERLINE 200

카테고리

개요

활성 등재물

서비스

상위 등재물

EVATEC / UNAXIS / OERLIKON / BALZERS

CLUSTERLINE 200

EVATEC / UNAXIS / OERLIKON / BALZERS

CLUSTERLINE 200

EVATEC / UNAXIS / OERLIKON / BALZERS

CLUSTERLINE 200

EVATEC / UNAXIS / OERLIKON / BALZERS

CLUSTERLINE 200

Moov에 등재하고 즉시 완벽한 구매자를 찾으십시오.

EVATEC / UNAXIS / OERLIKON / BALZERS

CLUSTERLINE 200

EVATEC / UNAXIS / OERLIKON / BALZERS

CLUSTERLINE 200

EVATEC / UNAXIS / OERLIKON / BALZERS

CLUSTERLINE 200

EVATEC / UNAXIS / OERLIKON / BALZERS

CLUSTERLINE 200