설명
FIB Equipped with 100mm² EDS환경 설정
Electron Source: Schottky thermal field emitter Accelerating Voltage Range: 350 V – 30 kV (Landing voltage in beam deceleration mode: 20 V – 30 kV) Probe Current Range: 0.7 pA – 22 nA Resolution: Best Working Distance: 0.8 nm @ 30 kV (STEM) 0.9 nm @ 15 kV ; 1.4 nm @ 1 kV Beam Coincidence Point: 0.9 – 1.0 nm @ 15 kV 1.6 nm @ 5 kV ; 2.5 nm @ 1 kV Bruker EDS: 100mm2 Detector (brand new detector installed in 2024)Gas Injection System (GIS): Pt and XeF2 (includes 2 gas injection needles/canisters)Automatic 3D Slice and 3DView: Integrated fully automatic 3D reconstruction software KLEINDIEK NANOTECHNIK MM3A-EM Manipulator: (Non-OEM / third-party manipulator)OEM 모델 설명
The Helios NanoLab 600 is a Dual Beam FIB/SEM (Focused Ion Beam/Scanning Electron Microscope) that is designed for high-end imaging during failure analysis. It features an extreme high-resolution column, a fine-probe ion source, and a 150 x 150 mm, five-axis, XY piezo stage. This makes it a smart investment for failure-analysis labs that require versatile sample handling, from packaged parts to eight-inch wafers. The Helios NanoLab 600 is particularly useful for cross-sectioning samples and delivers three-dimensional imaging, allowing you to quickly and efficiently locate and view device features from different angles. Additionally, patented beam chemistries can be used to highlight interface layers for imaging in the system, providing you with the most accurate data possible without additional preparation steps outside the system.문서
문서 없음
카테고리
SEM / FIB
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
153199
웨이퍼 사이즈:
알 수 없음
빈티지:
2010
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
THERMOFISHER SCIENTIFIC / FEI / PHILIPS
HELIOS NANOLAB 600
카테고리
SEM / FIB
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
153199
웨이퍼 사이즈:
알 수 없음
빈티지:
2010
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
FIB Equipped with 100mm² EDS환경 설정
Electron Source: Schottky thermal field emitter Accelerating Voltage Range: 350 V – 30 kV (Landing voltage in beam deceleration mode: 20 V – 30 kV) Probe Current Range: 0.7 pA – 22 nA Resolution: Best Working Distance: 0.8 nm @ 30 kV (STEM) 0.9 nm @ 15 kV ; 1.4 nm @ 1 kV Beam Coincidence Point: 0.9 – 1.0 nm @ 15 kV 1.6 nm @ 5 kV ; 2.5 nm @ 1 kV Bruker EDS: 100mm2 Detector (brand new detector installed in 2024)Gas Injection System (GIS): Pt and XeF2 (includes 2 gas injection needles/canisters)Automatic 3D Slice and 3DView: Integrated fully automatic 3D reconstruction software KLEINDIEK NANOTECHNIK MM3A-EM Manipulator: (Non-OEM / third-party manipulator)OEM 모델 설명
The Helios NanoLab 600 is a Dual Beam FIB/SEM (Focused Ion Beam/Scanning Electron Microscope) that is designed for high-end imaging during failure analysis. It features an extreme high-resolution column, a fine-probe ion source, and a 150 x 150 mm, five-axis, XY piezo stage. This makes it a smart investment for failure-analysis labs that require versatile sample handling, from packaged parts to eight-inch wafers. The Helios NanoLab 600 is particularly useful for cross-sectioning samples and delivers three-dimensional imaging, allowing you to quickly and efficiently locate and view device features from different angles. Additionally, patented beam chemistries can be used to highlight interface layers for imaging in the system, providing you with the most accurate data possible without additional preparation steps outside the system.문서
문서 없음