설명

EMWC Chuck 1 on left, Chuck 2 on right:

환경 설정

Test Parameter Value Unit EMZQ RMS Z5-Z37 (NCE) 1.16 nm EMZQ RMSSpherical (NCE) 0.57 nm EMZQ RMSComa (NCE) 0.49 nm EMZQ RMSAstigmatism (NCE) 0.36 nm EMZQ RMS3-foil (NCE) 0.49 nm lUSU Slit Uniformity 0.15 % lUSU Avg. SSlight Intensity (corrected 1 BP) 8390.21 mW/cm'2 FOCAL(FPCM) Focus Range Chuck 1 (after correction) 32.9 nm FOCAL(FPCM) Focus Range Chuck 2 (after correction) 38.0 nm FOCAL(FPCM) Astigmatism Range Chuck 1 (after correction) 10.3 nm FOCAL(FPCM) Astigmatism Range Chuck2 (after correction) 10.1 nm FOCAL(FPCM) St. Dev. Residue Chuck 1 (after correction) 3.3 nm FOCAL(FPCM) St. Dev. Residue Chuck 2 (after correction) 4.2 nm FOCAL(FPCM) Maximum Residue Chuck 1 (after correction) 7.3 nm FOCAL(FPCM) Maximum Residue Chuck2 (after correction) 8.9 nm FOCAL(FPCM) ImagePlaneDeviation 35 nm FOCAL(FPCM) Astigmatism 10 nm FINAL XV (XVDO) Overlay Error - Maximum 99.7%, X 3.4 nm FINAL XV (XVDO) Overlay Error - Maximum 99.7%, V 2.6 nm

OEM 모델 설명

The TWINSCAN XT:1060K is ASML’s most advanced KrF (krypton fluoride) laser ‘dry’ lithography system. The TWINSCAN XT:1060K 248 nm step-and-scan system is a dual-stage lithography tool with the highest NA and productivity in the industry, designed for 300 mm wafer production. Extending critical KrF technology reduces our customers' cost per layer while allowing them to benefit from mature KrF processing.