설명
설명 없음환경 설정
Asset Description: ASML KrF Twinscan Software Version: 5.1 CIM: SECS/GEM Process: 12LP Main System: Main Tool Body (1) Handler System: TEL TRK interface (1) Factory Interface: FOUP (2)OEM 모델 설명
The TWINSCAN XT:1060K is ASML’s most advanced KrF (krypton fluoride) laser ‘dry’ lithography system. The TWINSCAN XT:1060K 248 nm step-and-scan system is a dual-stage lithography tool with the highest NA and productivity in the industry, designed for 300 mm wafer production. Extending critical KrF technology reduces our customers' cost per layer while allowing them to benefit from mature KrF processing.문서
문서 없음
카테고리
Steppers & Scanners
마지막 검증일: 오늘
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
138151
웨이퍼 사이즈:
12"/300mm
빈티지:
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
TWINSCAN XT:1060K
카테고리
Steppers & Scanners
마지막 검증일: 오늘
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
138151
웨이퍼 사이즈:
12"/300mm
빈티지:
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Asset Description: ASML KrF Twinscan Software Version: 5.1 CIM: SECS/GEM Process: 12LP Main System: Main Tool Body (1) Handler System: TEL TRK interface (1) Factory Interface: FOUP (2)OEM 모델 설명
The TWINSCAN XT:1060K is ASML’s most advanced KrF (krypton fluoride) laser ‘dry’ lithography system. The TWINSCAN XT:1060K 248 nm step-and-scan system is a dual-stage lithography tool with the highest NA and productivity in the industry, designed for 300 mm wafer production. Extending critical KrF technology reduces our customers' cost per layer while allowing them to benefit from mature KrF processing.문서
문서 없음