설명
Main Process: Photo Sub-Process: ARF Scanner환경 설정
S/W version: 5.1.0 Laser Type: cyber XLA 360 Laser Remaining Lifetime: 95.1% Lens Type: 1700i NA: 1.2 Lens Data (EMZQ): Current [nm] Spherical: 0.65 Coma: 0.84 Astigmatism: 0.54 3-foil: 0.71 (25->Z37): 2.66 Focus Range (Chuck 1/2) 22/24 Details AttachedOEM 모델 설명
The TWINSCAN XT:1700Fi is a state-of-the-art, dual-stage immersion lithography tool, specifically engineered for high-volume 300-mm wafer production. It boasts a resolution of 50 nm and below, making it a powerhouse for intricate semiconductor manufacturing. It features a 1.2-NA in-line catadioptric lens, an illuminator with optimized polarization mode, and advanced stage technology. It meets overlay and focus requirements and achieves a throughput of 122 wafers per hour. The tool also includes an extended ultra-k1 package with various enhancements.문서
카테고리
Steppers & Scanners
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
145984
웨이퍼 사이즈:
12"/300mm
빈티지:
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
ASML
TWINSCAN XT:1700Fi
카테고리
Steppers & Scanners
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
145984
웨이퍼 사이즈:
12"/300mm
빈티지:
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available