설명
Photolithography Scanner 248nm Handler System - WL Type 3 Interface - Open Cassette환경 설정
Software Version - MCSV CIM - SECS Process - PhotolithographyOEM 모델 설명
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.문서
문서 없음
유사 등재물
모두 보기
NIKON
NSR-S204B
카테고리
Steppers & Scanners
마지막 검증일: 6일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
146714
웨이퍼 사이즈:
8"/200mm
빈티지:
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Photolithography Scanner 248nm Handler System - WL Type 3 Interface - Open Cassette환경 설정
Software Version - MCSV CIM - SECS Process - PhotolithographyOEM 모델 설명
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.문서
문서 없음