설명
Software Version - Summit 4.9 CIM - SECs/GEM Process - Thickness Film Measurement환경 설정
Factory Interface - FOUP - Quantity- 2 Handler System - ASYST S3OEM 모델 설명
The ASET-F5x is a thin film metrology system that can measure materials across a continuous wavelength spectrum from 190 nm to 800 nm. It accurately measures complex multi-layer thin film stacks using spectroscopic ellipsometry and precisely measures advanced, ultra-thin gate dielectric films. It provides the accuracy, repeatability, and system-to-system matching required to monitor advanced ICs with geometries as small as 0.1 micron. Its applications include diffusion films/film deposition, CMP, lithography, and etch.문서
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유사 등재물
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KLA
ASET-F5x
카테고리
Thin Film / Film Thickness
마지막 검증일: 11일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Installed / Running
제품 ID:
150567
웨이퍼 사이즈:
12"/300mm
빈티지:
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Software Version - Summit 4.9 CIM - SECs/GEM Process - Thickness Film Measurement환경 설정
Factory Interface - FOUP - Quantity- 2 Handler System - ASYST S3OEM 모델 설명
The ASET-F5x is a thin film metrology system that can measure materials across a continuous wavelength spectrum from 190 nm to 800 nm. It accurately measures complex multi-layer thin film stacks using spectroscopic ellipsometry and precisely measures advanced, ultra-thin gate dielectric films. It provides the accuracy, repeatability, and system-to-system matching required to monitor advanced ICs with geometries as small as 0.1 micron. Its applications include diffusion films/film deposition, CMP, lithography, and etch.문서
문서 없음