설명
Post CMW Scrubber환경 설정
Dual brush and top side brush chambers, spin dry Gas - 1:100 DHF, 1:100 NH4OH PROGRESS TYPE: WET/ CMP COMPONENT: MAINFRAME CHEMICAL CABINET x 2EA MX-7500 TBC BRUSH LOAD CELL AMP PRE-TECH FINEJET GENERATOR 0.500VA AC TRANSFOMER FA-21000A PC SGD DRIVE_YASKAWA HF CIRCULATION FILTER UT3-F3AE-B TOUCH PANEL HFC-VWE HITACHI INVERTER RORZE CURT-2032-0 SLURRY FLOW CONTROLLER INTERFACE/ POWER BOXOEM 모델 설명
The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.문서
문서 없음
카테고리
Wet Benches - Auto
마지막 검증일: 15일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
119534
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기SCREEN / DNS / DAINIPPON SCREEN
AS-2000
카테고리
Wet Benches - Auto
마지막 검증일: 15일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
119534
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Post CMW Scrubber환경 설정
Dual brush and top side brush chambers, spin dry Gas - 1:100 DHF, 1:100 NH4OH PROGRESS TYPE: WET/ CMP COMPONENT: MAINFRAME CHEMICAL CABINET x 2EA MX-7500 TBC BRUSH LOAD CELL AMP PRE-TECH FINEJET GENERATOR 0.500VA AC TRANSFOMER FA-21000A PC SGD DRIVE_YASKAWA HF CIRCULATION FILTER UT3-F3AE-B TOUCH PANEL HFC-VWE HITACHI INVERTER RORZE CURT-2032-0 SLURRY FLOW CONTROLLER INTERFACE/ POWER BOXOEM 모델 설명
The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.문서
문서 없음