설명
POST CMP CLEANING SYSTEM환경 설정
Dual brush and top side brush chambers, spin dry Post CMP ScrubberOEM 모델 설명
The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.문서
문서 없음
SCREEN / DNS / DAINIPPON SCREEN
AS-2000
검증됨
카테고리
Wet Benches - Auto
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
93099
웨이퍼 사이즈:
8"/200mm
빈티지:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
SCREEN / DNS / DAINIPPON SCREEN
AS-2000
카테고리
Wet Benches - Auto
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
93099
웨이퍼 사이즈:
8"/200mm
빈티지:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
POST CMP CLEANING SYSTEM환경 설정
Dual brush and top side brush chambers, spin dry Post CMP ScrubberOEM 모델 설명
The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.문서
문서 없음