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설명
설명 없음환경 설정
-standard handling with standard chuck and vacuum EEF -RDM module (rinse and dry module for special clean and dry application after process on standard chuck; removes ---chemical residues at frontside after standard process on chuck ) -windows 3.11 operating system (very stable) -very new chemical modules (3pcs) with new chemical controller -standard Brooks ATM robot handlings system -running operating system with tool SW -TestedOEM 모델 설명
The SEZ 203 Spin-Processor is a single wafer processing system that can use up to three different chemical solutions in a programmable sequence for processing wafers. It is capable of processing wafers with sizes of 125mm, 150mm, and 200mm. It has options like Endpoint Detection System, ozone processing, and contamination-free robot handling. It supports applications such as Photolithography Yield Enhancement, Back Surface Metal Clean, and Silicon Etch. The system can recycle, heat, and filter chemical solutions or use them in a single pass mode.문서
문서 없음
카테고리
Wet Etch
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
116204
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
LAM RESEARCH / SEZ
SP203
카테고리
Wet Etch
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
116204
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
-standard handling with standard chuck and vacuum EEF -RDM module (rinse and dry module for special clean and dry application after process on standard chuck; removes ---chemical residues at frontside after standard process on chuck ) -windows 3.11 operating system (very stable) -very new chemical modules (3pcs) with new chemical controller -standard Brooks ATM robot handlings system -running operating system with tool SW -TestedOEM 모델 설명
The SEZ 203 Spin-Processor is a single wafer processing system that can use up to three different chemical solutions in a programmable sequence for processing wafers. It is capable of processing wafers with sizes of 125mm, 150mm, and 200mm. It has options like Endpoint Detection System, ozone processing, and contamination-free robot handling. It supports applications such as Photolithography Yield Enhancement, Back Surface Metal Clean, and Silicon Etch. The system can recycle, heat, and filter chemical solutions or use them in a single pass mode.문서
문서 없음