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TEL / TOKYO ELECTRON ACT 12
  • TEL / TOKYO ELECTRON ACT 12
  • TEL / TOKYO ELECTRON ACT 12
  • TEL / TOKYO ELECTRON ACT 12
설명
Single Block (Resist Developer)
환경 설정
환경 설정 없음
OEM 모델 설명
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.
문서

문서 없음

카테고리
Coaters & Developers

마지막 검증일: 12일 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

119736


웨이퍼 사이즈:

12"/300mm


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기

TEL / TOKYO ELECTRON

ACT 12

verified-listing-icon
검증됨
카테고리
Coaters & Developers
마지막 검증일: 12일 전
listing-photo-33d9f349550b4acb959f80e551e008a2-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

119736


웨이퍼 사이즈:

12"/300mm


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Single Block (Resist Developer)
환경 설정
환경 설정 없음
OEM 모델 설명
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.
문서

문서 없음

유사 등재물
모두 보기