설명
1.Inline: Nikon in-line 2.Pump: RRC 8 One 3.Main Controller：Type3 4.Spin Motor type: Panasonic 5.Chemical supplier: ADH local Solvents/Dev CSS 6.T/H controller：2 tower model：ME2환경 설정
PN: MD-E220490/MD-E220494OEM 모델 설명
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.문서
문서 없음
TEL / TOKYO ELECTRON
ACT 12
검증됨
카테고리
Coaters & Developers
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
114303
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
TEL / TOKYO ELECTRON
ACT 12
카테고리
Coaters & Developers
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
114303
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
1.Inline: Nikon in-line 2.Pump: RRC 8 One 3.Main Controller：Type3 4.Spin Motor type: Panasonic 5.Chemical supplier: ADH local Solvents/Dev CSS 6.T/H controller：2 tower model：ME2환경 설정
PN: MD-E220490/MD-E220494OEM 모델 설명
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.문서
문서 없음