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TEL / TOKYO ELECTRON ACT 12
  • TEL / TOKYO ELECTRON ACT 12
  • TEL / TOKYO ELECTRON ACT 12
  • TEL / TOKYO ELECTRON ACT 12
  • TEL / TOKYO ELECTRON ACT 12
  • TEL / TOKYO ELECTRON ACT 12
  • TEL / TOKYO ELECTRON ACT 12
  • TEL / TOKYO ELECTRON ACT 12
설명
설명 없음
환경 설정
ACT-12(2C2D) Direction: LEFT HAND SIDE ➢ Utilized with Nikon S204/205 Scanner Exposure Tool ➢ General iUSC SECSI, SECSII, HSMS, & GEM Interface Compatibility 3 Blocks Interfaced: Foup-Process Block-Scanner Interface 3 Wafer Transfer Robot Arms: Foup-Process Block-Scanner Interface Control Module on Cassette End-Station (CES) or Foup ➢ Interface Block Single-pincette shared wafer transfer with centering guides Standard wafer arm and interface panel to accommodate stepper/scanner Interface includes a CPL for insuring consistent wafer temps into the stepper/scanner ➢ 2 Coaters (COT) 4 resist nozzles with temperature control 16 layer resist and solvent filters T-100 resist pumps 4L or 1L Nowpak capability ➢ 2 Developers (DEV) 2 “H” nozzles with temperature control per cup 16 layer developer filter Bulk-FSI system for developer ➢ 2 Adhesion Process Stations (ADH) Half sealed chamber with dispersion plate for HMDS ➢ 5 Chill Plate Process Stations with temperature control (CPL) ➢ 1 Transfer Chill Plate (TCP) ➢ 8 Low Temperature Hot Plate Process Stations with temperature control (LHP) ➢ 4 Precision Chilling Hot Plate Process Stations for SB or PEB (PHP) ➢ 1 Wafer Edge Exposure Process Station (WEE) DUV illumination monitor on lamp housing Uses a 250W ultra pressure Mercury lamp with 5x4mm illumination pattern ➢ Subcomponents Fluid Temperature Controller Temperature & Humidity Controller Chemical Cabinet AC Power Box ➢ Note : Exclude HDD
OEM 모델 설명
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.
문서
PREFERRED
 
SELLER
카테고리
Coaters & Developers

마지막 검증일: 60일 이상 전

Buyer pays 12% premium of final sale price
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

103654


웨이퍼 사이즈:

12"/300mm


빈티지:

2001


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
PREFERRED
 
SELLER

TEL / TOKYO ELECTRON

ACT 12

verified-listing-icon
검증됨
카테고리
Coaters & Developers
마지막 검증일: 60일 이상 전
listing-photo-d82e75f32a8142f4b63be6c6df7ce67c-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/30409/d82e75f32a8142f4b63be6c6df7ce67c/a8f8e3161457461e881e1f993cb91b97_telact12singleblockcheantrackfors205page3image0004_mw.jpg
listing-photo-d82e75f32a8142f4b63be6c6df7ce67c-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/30409/d82e75f32a8142f4b63be6c6df7ce67c/534b1a851c104f4f935656e42164f07e_telact12singleblockcheantrackfors205page2image0002_mw.jpg
listing-photo-d82e75f32a8142f4b63be6c6df7ce67c-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/30409/d82e75f32a8142f4b63be6c6df7ce67c/411701d6fbd54648ac2d11335156b2e7_telact12singleblockcheantrackfors205page2image0001_mw.jpg
listing-photo-d82e75f32a8142f4b63be6c6df7ce67c-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/30409/d82e75f32a8142f4b63be6c6df7ce67c/d1018ce5ac1c44c7b4d9c4bc69fbd8b2_telact12singleblockcheantrackfors205page3image0001_mw.jpg
listing-photo-d82e75f32a8142f4b63be6c6df7ce67c-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/30409/d82e75f32a8142f4b63be6c6df7ce67c/d4e765ad1bb546988103f96653cb60fb_telact12singleblockcheantrackfors205page4image0001_mw.jpg
listing-photo-d82e75f32a8142f4b63be6c6df7ce67c-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/30409/d82e75f32a8142f4b63be6c6df7ce67c/ac73eb3498af4da1a4bdba0b1cc7c327_telact12singleblockcheantrackfors205page3image0002_mw.jpg
listing-photo-d82e75f32a8142f4b63be6c6df7ce67c-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/30409/d82e75f32a8142f4b63be6c6df7ce67c/33f3a6a57fef4086affee2e57a736ca5_telact12singleblockcheantrackfors205page3image0003_mw.jpg
Buyer pays 12% premium of final sale price
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

103654


웨이퍼 사이즈:

12"/300mm


빈티지:

2001


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음
환경 설정
ACT-12(2C2D) Direction: LEFT HAND SIDE ➢ Utilized with Nikon S204/205 Scanner Exposure Tool ➢ General iUSC SECSI, SECSII, HSMS, & GEM Interface Compatibility 3 Blocks Interfaced: Foup-Process Block-Scanner Interface 3 Wafer Transfer Robot Arms: Foup-Process Block-Scanner Interface Control Module on Cassette End-Station (CES) or Foup ➢ Interface Block Single-pincette shared wafer transfer with centering guides Standard wafer arm and interface panel to accommodate stepper/scanner Interface includes a CPL for insuring consistent wafer temps into the stepper/scanner ➢ 2 Coaters (COT) 4 resist nozzles with temperature control 16 layer resist and solvent filters T-100 resist pumps 4L or 1L Nowpak capability ➢ 2 Developers (DEV) 2 “H” nozzles with temperature control per cup 16 layer developer filter Bulk-FSI system for developer ➢ 2 Adhesion Process Stations (ADH) Half sealed chamber with dispersion plate for HMDS ➢ 5 Chill Plate Process Stations with temperature control (CPL) ➢ 1 Transfer Chill Plate (TCP) ➢ 8 Low Temperature Hot Plate Process Stations with temperature control (LHP) ➢ 4 Precision Chilling Hot Plate Process Stations for SB or PEB (PHP) ➢ 1 Wafer Edge Exposure Process Station (WEE) DUV illumination monitor on lamp housing Uses a 250W ultra pressure Mercury lamp with 5x4mm illumination pattern ➢ Subcomponents Fluid Temperature Controller Temperature & Humidity Controller Chemical Cabinet AC Power Box ➢ Note : Exclude HDD
OEM 모델 설명
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.
문서
유사 등재물
모두 보기