설명
P500038 with 4 Chambers Wafer Size Range Minimum 150 mm Maximum 200 mm Set Size 150 mm Number of Chambers 4 Power Requirements 200-208 V 180.0 A 50/60 Hz환경 설정
Chamber A/B TEOS Chamber C/D EtchOEM 모델 설명
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.문서
문서 없음
카테고리
CVD
마지막 검증일: 4일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
147426
웨이퍼 사이즈:
알 수 없음
빈티지:
1992
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT)
P5000 CVD
카테고리
CVD
마지막 검증일: 4일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
147426
웨이퍼 사이즈:
알 수 없음
빈티지:
1992
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
P500038 with 4 Chambers Wafer Size Range Minimum 150 mm Maximum 200 mm Set Size 150 mm Number of Chambers 4 Power Requirements 200-208 V 180.0 A 50/60 Hz환경 설정
Chamber A/B TEOS Chamber C/D EtchOEM 모델 설명
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.문서
문서 없음