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6" Fab For Sale from Moov - Click Here to Learn More
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LAM RESEARCH CORPORATION TCP 9600SE
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    ETCH
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The TCP 9600SE is a high density, low pressure etch system from Lam’s TCP product line. It incorporates the Company’s patented Transformer Coupled Plasma source technology for etching 0.35 micron and smaller geometries. It is used for metal etch applications and is designed to offer customers a reliable, lower cost of ownership solution to their advanced needs. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. It is available as a stand-alone, single wafer tool, or on the Alliance multichamber cluster platform.
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    LAM RESEARCH CORPORATION

    TCP 9600SE

    verified-listing-icon

    검증됨

    카테고리
    Dry / Plasma Etch

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    105977


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    LAM RESEARCH CORPORATION TCP 9600SE

    LAM RESEARCH CORPORATION

    TCP 9600SE

    Dry / Plasma Etch
    빈티지: 0조건: 중고
    마지막 검증일60일 이상 전

    LAM RESEARCH CORPORATION

    TCP 9600SE

    verified-listing-icon
    검증됨
    카테고리
    Dry / Plasma Etch
    마지막 검증일: 60일 이상 전
    listing-photo-6673bf8a1e704512863ea6878d0c0561-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    105977


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    ETCH
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The TCP 9600SE is a high density, low pressure etch system from Lam’s TCP product line. It incorporates the Company’s patented Transformer Coupled Plasma source technology for etching 0.35 micron and smaller geometries. It is used for metal etch applications and is designed to offer customers a reliable, lower cost of ownership solution to their advanced needs. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. It is available as a stand-alone, single wafer tool, or on the Alliance multichamber cluster platform.
    문서

    문서 없음

    유사 등재물
    모두 보기
    LAM RESEARCH CORPORATION TCP 9600SE

    LAM RESEARCH CORPORATION

    TCP 9600SE

    Dry / Plasma Etch빈티지: 0조건: 중고마지막 검증일:60일 이상 전
    LAM RESEARCH CORPORATION TCP 9600SE

    LAM RESEARCH CORPORATION

    TCP 9600SE

    Dry / Plasma Etch빈티지: 0조건: 중고마지막 검증일:60일 이상 전
    LAM RESEARCH CORPORATION TCP 9600SE

    LAM RESEARCH CORPORATION

    TCP 9600SE

    Dry / Plasma Etch빈티지: 0조건: 개조됨마지막 검증일:60일 이상 전