설명
Plasma-Therm Dual Chamber 790 PECVD (on side Low Freq. & other side 13.56Mhz) could be converted to both sides 13.56MHz Plasma-Therm 790 PECVD upper Electrode Low Freq. & Lower electrode High Freq. Plasma-Therm 790 RIE Parts tool Plasma-Therm 790 PECVD Plasma-Therm 790 PECVD Plasma-Therm SLR 720 RIE Plasma-Therm SLR 720 RIE Plasma-Therm SLR 720 RIE Plasma-Therm SLR 720 RIE Plasma-Therm SLR 720 RIE Plasma-Therm VLR VersaWorks Cluster tool- one chamber PECVD Plasma-Therm VLN (Versaline) ICP – single wafer manual load Plasma-Therm VLN (Versaline) ICP – two wafer Brooks handler – manual load YESHMDS Class 10 – all Stainless Steel환경 설정
환경 설정 없음OEM 모델 설명
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.문서
문서 없음
카테고리
Dry / Plasma Etch
마지막 검증일: 7일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
138656
웨이퍼 사이즈:
2"/50mm, 3"/75mm, 4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
PLASMATHERM
790
카테고리
Dry / Plasma Etch
마지막 검증일: 7일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
138656
웨이퍼 사이즈:
2"/50mm, 3"/75mm, 4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Plasma-Therm Dual Chamber 790 PECVD (on side Low Freq. & other side 13.56Mhz) could be converted to both sides 13.56MHz Plasma-Therm 790 PECVD upper Electrode Low Freq. & Lower electrode High Freq. Plasma-Therm 790 RIE Parts tool Plasma-Therm 790 PECVD Plasma-Therm 790 PECVD Plasma-Therm SLR 720 RIE Plasma-Therm SLR 720 RIE Plasma-Therm SLR 720 RIE Plasma-Therm SLR 720 RIE Plasma-Therm SLR 720 RIE Plasma-Therm VLR VersaWorks Cluster tool- one chamber PECVD Plasma-Therm VLN (Versaline) ICP – single wafer manual load Plasma-Therm VLN (Versaline) ICP – two wafer Brooks handler – manual load YESHMDS Class 10 – all Stainless Steel환경 설정
환경 설정 없음OEM 모델 설명
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.문서
문서 없음