메인 콘텐츠로 건너뛰기
6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
Moov logo

6" Fab For Sale from Moov - Click Here to Learn More
Moov Icon
PLASMATHERM 790
    설명
    설명 없음
    환경 설정
    790 RIE System - Max wafer size capable: 8"/200mm - RFPP RF5S 500W RF Generator - Leybold 361C Turbo Pump (Qty 1) - Leybold NT 150/360 Controller - MKS 1160B MFCs (gas configuration listed below) - Chiller - Edwards QDP40 Dry Pump (or equivalent) - Operator Manual and Documentation Gas Configuration consists of: - O2 200sccm - H2 100sccm - CH4 20sccm - CHF3 200sccm Single RIE Chamber Ideal for R&D
    OEM 모델 설명
    The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
    문서

    문서 없음

    PLASMATHERM

    790

    verified-listing-icon

    검증됨

    카테고리
    Dry / Plasma Etch

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    19003


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etch
    빈티지: 0조건: 중고
    마지막 검증일5일 전

    PLASMATHERM

    790

    verified-listing-icon
    검증됨
    카테고리
    Dry / Plasma Etch
    마지막 검증일: 60일 이상 전
    listing-photo-mH6ezA2G6pSHTmIHJokMW1jJmmuof34aILxGiZMXLLo-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1689/mH6ezA2G6pSHTmIHJokMW1jJmmuof34aILxGiZMXLLo/88bb932bdd394fe08fab99577b935ae3_214783e4b0834f0baa1b0df66de1b5a01201a_mw.jpeg
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    19003


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    790 RIE System - Max wafer size capable: 8"/200mm - RFPP RF5S 500W RF Generator - Leybold 361C Turbo Pump (Qty 1) - Leybold NT 150/360 Controller - MKS 1160B MFCs (gas configuration listed below) - Chiller - Edwards QDP40 Dry Pump (or equivalent) - Operator Manual and Documentation Gas Configuration consists of: - O2 200sccm - H2 100sccm - CH4 20sccm - CHF3 200sccm Single RIE Chamber Ideal for R&D
    OEM 모델 설명
    The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
    문서

    문서 없음

    유사 등재물
    모두 보기
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etch빈티지: 0조건: 중고마지막 검증일:5일 전
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etch빈티지: 1993조건: 중고마지막 검증일:13일 전
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etch빈티지: 0조건: 개조됨마지막 검증일:60일 이상 전