설명
Chuck: E-chuck STS Main Etch chamber(72” L x 24” W x 48” H): ASE Type of loadlock:Single Wafer Loadlock RF Power Chart(32” L x 24” W x 40” H): ENI ACG-3 and ENI ACG-10B Low electrode Chiller ( 32” L x 24” W x 32” H): Neslab CFT-75 Pumps and pumping lines: leybold Turbo Pump Chamber Backing Pump:N/A Loadlock Pump:N/A Computer and monitor STS remote gas cabinet (32” L x 13” W x 60” H), Air cannister (12” L x 12” W x 24” H) & accessories. 5 gas lines with 4 of MFCs including Cl2환경 설정
환경 설정 없음OEM 모델 설명
The STS MULTIPLEX ICP is an etch system. The STS MULTIPLEX ICP can be used with 2” wafer sizes. It has a silicon material plate and ASE polymer system processer.문서
문서 없음
카테고리
Dry / Plasma Etch
마지막 검증일: 7일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
138672
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
STS
MULTIPLEX ICP
카테고리
Dry / Plasma Etch
마지막 검증일: 7일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
138672
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Chuck: E-chuck STS Main Etch chamber(72” L x 24” W x 48” H): ASE Type of loadlock:Single Wafer Loadlock RF Power Chart(32” L x 24” W x 40” H): ENI ACG-3 and ENI ACG-10B Low electrode Chiller ( 32” L x 24” W x 32” H): Neslab CFT-75 Pumps and pumping lines: leybold Turbo Pump Chamber Backing Pump:N/A Loadlock Pump:N/A Computer and monitor STS remote gas cabinet (32” L x 13” W x 60” H), Air cannister (12” L x 12” W x 24” H) & accessories. 5 gas lines with 4 of MFCs including Cl2환경 설정
환경 설정 없음OEM 모델 설명
The STS MULTIPLEX ICP is an etch system. The STS MULTIPLEX ICP can be used with 2” wafer sizes. It has a silicon material plate and ASE polymer system processer.문서
문서 없음