설명
Epitaxial Silicon (EPI)환경 설정
Centura Epi 300 (4-chamber) · Front-end factory interface equipped with two wafer load ports, compatible with both FOUP carriers and open cassette formats (OCLP) Factory Interface software version 5.3, with version 4.0 applicable for atmospheric configurations Central wafer transfer module Magnetically driven single-arm wafer handling robot featuring on-the-fly (OTF) alignment and wafer-on-blade (WOB) detection Integrated pneumatic manifold system Dual automatic single-wafer loadlock modules utilizing point-of-use vacuum pumps (iPUP) Four process reactor chambers Quartz dome assemblies (upper and lower) for each process module Dual-zone lamp heating assemblies (top and bottom) Wafer support susceptors Jet Pack forced-air cooling system Process exhaust handling system Temperature control via optical pyrometry with closed-loop PID regulation Remote frame support structure Process gas delivery panel incorporating mass flow controllers (MFCs) and control valves Integrated leak detection and safety interlock systems Optional ambient control chamber (ACC) providing buffered storage capacity for up to 50 wafers Optional Fast Loadlock Ozonation (FLO-Zone) module for integrated oxide passivation in atmospheric configurations Vacuum configuration for reduced-pressure systems includes a dedicated iPUP for the transfer chamber and high-capacity remote pumps for each process chamber System controller: c300NT mainframe operating on a Windows NT platform Front-end PC (FE PC) providing user interface, system configuration, and operational control of the c300NT systemOEM 모델 설명
Applied Centura RP (reduced pressure) Epi systems.문서
문서 없음
카테고리
Epitaxial deposition (EPI)
마지막 검증일: 6일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
150083
웨이퍼 사이즈:
12"/300mm
빈티지:
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT)
CENTURA RP EPI
카테고리
Epitaxial deposition (EPI)
마지막 검증일: 6일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
150083
웨이퍼 사이즈:
12"/300mm
빈티지:
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Epitaxial Silicon (EPI)환경 설정
Centura Epi 300 (4-chamber) · Front-end factory interface equipped with two wafer load ports, compatible with both FOUP carriers and open cassette formats (OCLP) Factory Interface software version 5.3, with version 4.0 applicable for atmospheric configurations Central wafer transfer module Magnetically driven single-arm wafer handling robot featuring on-the-fly (OTF) alignment and wafer-on-blade (WOB) detection Integrated pneumatic manifold system Dual automatic single-wafer loadlock modules utilizing point-of-use vacuum pumps (iPUP) Four process reactor chambers Quartz dome assemblies (upper and lower) for each process module Dual-zone lamp heating assemblies (top and bottom) Wafer support susceptors Jet Pack forced-air cooling system Process exhaust handling system Temperature control via optical pyrometry with closed-loop PID regulation Remote frame support structure Process gas delivery panel incorporating mass flow controllers (MFCs) and control valves Integrated leak detection and safety interlock systems Optional ambient control chamber (ACC) providing buffered storage capacity for up to 50 wafers Optional Fast Loadlock Ozonation (FLO-Zone) module for integrated oxide passivation in atmospheric configurations Vacuum configuration for reduced-pressure systems includes a dedicated iPUP for the transfer chamber and high-capacity remote pumps for each process chamber System controller: c300NT mainframe operating on a Windows NT platform Front-end PC (FE PC) providing user interface, system configuration, and operational control of the c300NT systemOEM 모델 설명
Applied Centura RP (reduced pressure) Epi systems.문서
문서 없음