설명
Mask Aligner환경 설정
KARL SUSS MJB3 Type:10000003 Power 220v/50Hz/500VA UV400 Optics Lamp House 200 watt Operation Modes: Soft Contact/Hard Contact Chuck for 3” wafers and Mask Holder for 4” masks Single Microscope with 3 objectives X5, X10, X20 (Includes illumination power supply) UV Power Supply 1000watt, (For the mercury lamp) with offboard Ignition Box. Operation/Service Manual (soft pdf file)OEM 모델 설명
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."문서
문서 없음
SUSS MicroTec / KARL SUSS
MJB3
검증됨
카테고리
Mask/Bond Aligners
마지막 검증일: 2일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
66669
웨이퍼 사이즈:
3"/75mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
SUSS MicroTec / KARL SUSS
MJB3
카테고리
Mask/Bond Aligners
마지막 검증일: 2일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
66669
웨이퍼 사이즈:
3"/75mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Mask Aligner환경 설정
KARL SUSS MJB3 Type:10000003 Power 220v/50Hz/500VA UV400 Optics Lamp House 200 watt Operation Modes: Soft Contact/Hard Contact Chuck for 3” wafers and Mask Holder for 4” masks Single Microscope with 3 objectives X5, X10, X20 (Includes illumination power supply) UV Power Supply 1000watt, (For the mercury lamp) with offboard Ignition Box. Operation/Service Manual (soft pdf file)OEM 모델 설명
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."문서
문서 없음